Analysis of Corner Detail Design in Clean Areas of the Semiconductor and Electronics Industry

In the design of cleanrooms for the semiconductor and electronics industry, corner treatment is a seemingly simple yet critically important detail. Today, I will provide a detailed analysis of a common corner detail design for clean areas, which adopts a combined structure of aluminum alloy and color steel plates, balancing aesthetics, durability, and cleanliness requirements.

Key Components of the Corner Detail Schematic

1. Aluminum Alloy Outer Corner R50

Function: Serves as the external protective layer and decorative surface of the corner.

Specifications: Designed with a 50mm radius arc (R50).

Advantages:

Arc design prevents dust accumulation and facilitates cleaning.

Aluminum alloy material is corrosion-resistant and oxidation-resistant.

Smooth surface does not generate dust, meeting cleanliness requirements.

Arc transition reduces airflow vortices, maintaining laminar flow.

2. 50mm Thick Color Steel Plate

Core Structure: Acts as the main wall material.

Characteristics:

50mm thickness provides sufficient structural strength.

Sandwich panel structure offers excellent thermal insulation.

Surface coating is anti-static and corrosion-resistant.

Complies with cleanroom requirements for non-dust-generating and non-dust-accumulating surfaces.

3. Rivet Fixation

Connection Method: Secures the aluminum alloy corner to the color steel plate.

Advantages:

Quick and easy installation, suitable for rapid cleanroom construction.

Firm and reliable connection with no risk of loosening.

No welding required, avoiding the generation of contaminating particles.

Smooth surface with no protruding elements.

4. Aluminum Alloy Inner Arc R50

Internal Treatment: Symmetrical arc design matching the outer corner.

Functions:

Forms a complete arc transition with no dead corners.

Facilitates cleaning and disinfection, preventing microbial growth.

Maintains smooth internal airflow.

Enhances overall aesthetics and professionalism.

Design Key Points Analysis

Cleanliness Considerations:

Double-arc design completely eliminates 90-degree sharp corners, preventing dust accumulation.

All material surfaces are smooth and non-porous, meeting Class 100-10,000 cleanliness requirements.

Minimized seams reduce contamination risks.

Structural Stability:

50mm thick color steel plates provide sufficient wall strength.

Rivet spacing is typically controlled at 150-200mm to ensure firm connections.

Aluminum alloy edging enhances corner impact resistance.

Installation Process:

Install color steel plate walls first, leaving space for corners.

Customize aluminum alloy corner pieces after precise measurements.

Use specialized riveting tools for fixation.

Finally, perform seam sealing treatment.

Maintenance Convenience:

Arc design improves cleaning efficiency.

Aluminum alloy material withstands common cleaning agents.

Localized damage can be replaced individually, simplifying repairs.

Industry Application Value

This corner design is widely used in:

Semiconductor wafer fabrication facilities.

Microelectronics production cleanrooms.

Pharmaceutical GMP plants.

Precision instrument assembly areas.

High-cleanliness laboratory environments.

Through this professional corner treatment, not only are the performance metrics of the cleanroom improved, but its service life is also extended, while daily maintenance costs are reduced. It represents a perfect combination of functionality and cost-effectiveness.

Conclusion

In cleanroom construction, "details determine success or failure." Corner details like the one discussed here often best reflect the professional standards of a project. The aluminum alloy double-R corner design combined with color steel plates, as introduced in this article, has been validated through years of practice and is one of the preferred solutions for clean areas in the semiconductor and electronics industry. I hope this analysis provides valuable insights for designers and construction professionals in related fields.

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